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Handbook of Chemical Vapor Deposition

Handbook of Chemical Vapor Deposition

Principles, Technology and Applications

Hugh O. Pierson

William Andrew
Publication date : 1999-09-01

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Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.

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About the book

Author

Hugh O. Pierson

Imprint

William Andrew

Collection

n.c

Publication date

1999-09-01

Pages

506 pages

Print ISBN

9780815514329

Language

English

Ebook informations

EAN PDF DRM-FREE

9780815517436

Price

£152.97

Informations accessibility

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About author(s)

Hugh O. Pierson

Hugh Pierson is a private consultant in Chemical Vapor Deposition. He was the head of the Deposition

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