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High Density Plasma Sources

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High Density Plasma Sources

Design, Physics and Performance

Oleg A. Popov

William Andrew
Publication date : 1996-12-31

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This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.

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About the book

Author

Oleg A. Popov

Imprint

William Andrew

Collection

n.c

Publication date

1996-12-31

Pages

465 pages

Print ISBN

9780815513773

Language

English

Ebook informations

EAN EPUB DRM-FREE

9780815517894

Price

£131.88

Informations accessibility

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About author(s)

Oleg A. Popov

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