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Atomic Layer Deposition for Semiconductors

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Atomic Layer Deposition for Semiconductors

Cheol Seong Hwang, Cheol Seong Hwang

Springer
Publication date : 2013-10-18

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This edited volume discusses atomic layer deposition (ALD) for all modern semiconductor devices, moving from the basic chemistry of ALD and modeling of ALD processes to sections on ALD for memories, logic devices, and machines. The section on ALD for memories covers both mass-produced memories, such as DRAM and Flash, and emerging memories, such as PCRAM and FeRAM. The section on ALD for logic devices covers both front-end of the line processes and back-end of the line processes. The final section on ALD for machines looks at toolsets and systems hardware. Each chapter provides the history, operating principles, and a full explanation of ALD processes for each device.

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About the book

Author

Cheol Seong Hwang , Cheol Seong Hwang

Imprint

Springer

Collection

n.c

Publication date

2013-10-18

Pages

263 pages

Print ISBN

9781461480532

Language

English

Ebook informations

EAN EPUB

9781461480549

Price

£139.50

Copy count 2

Print count 26

File size 5345 Ko

Informations accessibility

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About author(s)

Cheol Seong Hwang

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